W0247

Grain Orientation and Strain Mapping of Passivated Aluminum Interconnect Wires with X-Ray Micro-Diffraction. A.A.MacDowell, C-H Chang, H.A.Padmore, J.R.Patel, Advanced Light Source, Lawrence Berkeley Laboratory, 1 Cyclotron Road, MS 2-400, Berkeley, CA 94720 USA

A micro x-ray diffraction facility aimed at the micron spatial scale is under development at the Advanced Light Source Synchrotron. Spot sizes are typically about 1 micron in size generated by means of Kirkpatrick Baez grazing incidence focusing mirrors. Photon energy is either white of energy range 6-14 keV, or monochromatic generated from a pair of channel cut crystals. Laue diffraction patterns from single grains along the length of a passivated 2 micron wide bamboo structured Aluminum interconnect wire have been recorded. Acquisition times are of the order of seconds. The Laue pattern has allowed the determination of the crystallographic orientation of individual grains along the wire length. By measuring the photon energy and position of the individual Laue spots the d spacing of separate planes can be measured. Variation of the d spacing from the unstrained case allows determination of strain in the individual grains along the wire length. The experimental and analysis procedure used will be described, as will the latest grain orientation and strain results. The impact of x-ray micro-diffraction and its possible future direction will be discussed in the context of other developments in the area of electromigration, and other technological problems.